Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
APPARATUS AND METHOD OF PLASMA DENSITY MEASUREMENT AND PLASMA PROCESSING APPARATUS AND METHOD BY USING IT
Document Type and Number:
Japanese Patent JP2001203097
Kind Code:
A
Abstract:

To provide a plasma processing apparatus easy to be installed in a manufacturing facilities without disturbance in plasma and without causing a large size of the apparatus.

The plasma processing apparatus has a tool to generate a plasma from a gas by introducing the gas into a vacuum vessel 4 with a window 13 closed with a disk-shaped dielectric substance 3 and by applying high frequency electric power via the dielectric substance 3, and is installed with a surface wave detection antenna 5 to detect a signal of the surface wave 10 propagating through the dielectric substance 3 and an oscilloscope 8 to detect electric field intensity distribution by receiving the signal of the surface wave 10 and by measuring signal strength equivalent to the electric field intensity and is provided with a density measuring tool to determine the plasma density by the detection of the electric field intensity distribution.


Inventors:
KITAGAWA HIDEO
SUZUKI NOBUMASA
Application Number:
JP2000000007949
Publication Date:
July 27, 2001
Filing Date:
January 17, 2000
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
CANON KK
International Classes:
G01R19/00; H05H1/00; H05H1/46; (IPC1-7): H05H1/00; H05H1/46
Attorney, Agent or Firm:
伊東 哲也 (外1名)