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Title:
APPARATUS AND METHOD FOR REGENERATING DEVELOPMENT WASTE LIQUID
Document Type and Number:
Japanese Patent JP2012210565
Kind Code:
A
Abstract:

To stably and efficiently carry out long-term regeneration treatment of a development waste liquid that contains resist exfoliation and tetraalkylammonium hydroxide (TAAH).

Acid is added to the development waste liquid containing resist exfoliation and TAAH to adjust the liquid to pH 8-9.5, and then membrane separation treatment is carried out by an MF membrane module 1. A permeated liquid is subjected to membrane separation treatment at a liquid permeation temperature of 40-80°C by a nanofiltration (NF) membrane module 2 with a molecular weight cutoff of 200-900 and treated in an activated carbon column 3. Setting the liquid permeation temperature of the NF membrane to 40-80°C lowers the viscosity of the treated liquid and suppresses an operating pressure to increase the amount of permeated liquid. When the amount of permeated liquid of the NF membrane is increased, the resist exfoliation leaks to the permeated liquid side of the NF membrane. However, since the resist exfoliation can be eliminated in the activated carbon treatment in a subsequent stage, a regenerated liquid of high TAAH purity can be obtained.


Inventors:
OSAWA KIMINOBU
KOFUNE KEIRYO
ONODA SEIICHI
CHO TOSHITSURA
SATO TAKAHIRO
Application Number:
JP2011077081A
Publication Date:
November 01, 2012
Filing Date:
March 31, 2011
Export Citation:
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Assignee:
KURITA WATER IND LTD
TAMA KAGAKU KOGYO KK
International Classes:
C02F1/44; B01D61/02; B01D61/10; B01D61/12; B01D61/14; B01D61/58; B01D65/02; C02F1/28
Attorney, Agent or Firm:
Tsuyoshi Shigeno