Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
APPARATUS AND METHOD FOR TREATING EMISSION GAS ACCOMPANIED POWDER
Document Type and Number:
Japanese Patent JP2011025140
Kind Code:
A
Abstract:

To provide an apparatus and a method for treating an emission gas which carry out an efficient cooling treatment of a high-temperature emission gas with a relatively simple configuration, are capable of separating an accompanying powder without adhesion to a passage or the wall surface of the apparatus and exhibit safety and good operability.

The emission gas treating apparatus includes a cooling treatment section 10 bringing an emission gas accompanied with powder into contact with cooling water to cool the emission gas and has an emission gas introduction portion 1 arranged at one end of the cooling treatment section 10 and introducing a high-temperature emission gas, an emission gas supplying portion 5 arranged at the other end of the cooling treatment section 10 and supplying the cooled emission gas and two or more cooling water introduction portions 2a to 2d arranged in the side surface of the cooling treatment section 10 and introducing cooling water. Cooling water from at least one of the cooling water introduction portions 2a to 2d is sprayed in the tangential direction with respect to the inside surface 3a of the cooling treatment section 10 to form a swirling flow C so as to form a water film F on the inside surface 3a.


Inventors:
HIRAOKA MANABU
TABATA MASAHIRO
NAKAMOTO NAOYUKI
SATO MISUZU
IBARAKI YOSHIHIRO
Application Number:
JP2009172347A
Publication Date:
February 10, 2011
Filing Date:
July 23, 2009
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
AIR LIQUIDE JAPAN LTD
International Classes:
B01D47/06; B01D47/00; B01D53/34; B01D53/77
Domestic Patent References:
JP2004277574A2004-10-07
JPH0268414A1990-03-07
Attorney, Agent or Firm:
Patent Business Corporation Unias International Patent Office