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Patent Searching and Data


Title:
CLEANING/DRYING APPARATUS AND CLEANING/DRYING METHOD
Document Type and Number:
Japanese Patent JP2000130941
Kind Code:
A
Abstract:

To provide a cleaning/drying apparatus or a cleaning/drying method capable of effective cleaning and drying in a short time irrespective of varieties of configurations of articles to be cleaned such as mechanical parts and electronic parts.

A cleaning/drying apparatus 1 includes in the order of a flow of an article to be cleaned a transfer apparatus 11, an introduction chamber 4, a cleaning tank 5, a rinse tank 6, a drying chamber 7, a discharge chamber 15, and a discharge apparatus 12. A movement of an article containing basket from the introduction chamber 4 to the cleaning tank 5, from the cleaning tank 5 to the rinse tank 6, from the rinse tank 6 to the drying chamber 7, from the rinse tank 6 to the drying chamber 7, and from the drying chamber 7 to the discharge chamber 15 is achieved with a vertical movement apparatus 8 and a horizontal movement apparatus 9, and in the drying chamber 7 there can be selected any drying of hot air blowing drying and pressure reduction drying.


Inventors:
KIKUHARA TOKUJIN
OGAWA KENJI
TSUBOI HIDEFUMI
TOGASHI YOSHIKI
Application Number:
JP30932898A
Publication Date:
May 12, 2000
Filing Date:
October 30, 1998
Export Citation:
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Assignee:
HITACHI CHEMICAL TECHNO PLANT
HITACHI CHEMICAL CO LTD
International Classes:
F26B3/04; F26B5/04; F26B15/14; (IPC1-7): F26B15/14; F26B3/04; F26B5/04
Attorney, Agent or Firm:
Kunihiko Wakabayashi