Title:
APPARATUS FOR MULTIPILE ELECTRON BEAM EXPOSURE
Document Type and Number:
Japanese Patent JPS5776837
Kind Code:
A
Abstract:
PURPOSE:To readily improve the exposing speed by constituting the apparatus by a multiple electron beams source, beam converging devices, a beam shaping mask, and a bi-dimensional deflecting device. CONSTITUTION:The beam selectively irradiated from holes 5 in an anode 6 of the multiple electron beams source are commonly converged by a first beam converging device 7 arranged under the anode 6 and projected on beam shaping holes 9 in the beam shaping mask 8. The beam shaping hole 9 is of a square shape, alined with the each hole in the anode 6, and arranged in a grid shape. The shaped electron beams are commonly reduced and converged by the second beam are commonly deflected 10 which is arranged under the mask. The reduced beams are commonly deflected by the bi-dimensional deflecting device 13 which comprises deflecting electrodes 11 and 12 and are arranged under the converging device 10, and projected on a specimen 14.
Inventors:
SASAKI TATEAKI
Application Number:
JP15268880A
Publication Date:
May 14, 1982
Filing Date:
October 30, 1980
Export Citation:
Assignee:
RIKAGAKU KENKYUSHO
International Classes:
H01L21/027; H01J37/30; H01J37/317; (IPC1-7): H01L21/30