Title:
APPARATUS FOR PLASMA PROCESSING
Document Type and Number:
Japanese Patent JPH0547713
Kind Code:
A
Abstract:
PURPOSE: To provide an apparatus for plasma processing capable of performing its plasma generation easily and preventing plasma damages and the adhesion of particles.
CONSTITUTION: In the titled apparatus in which a high frequency power 110 is supplied between the opposing electrodes 103 and 105 installed in a pressure reducible container 101 to generate plasma between them 115 thereby to process an object 106 set between the electrodes for the plasma processing, a projecting means is provided for irradiating ultraviolet rays 112 onto a gas being introduced into the container.
Inventors:
OMI TADAHIRO
WAKAMATSU HIDETOSHI
SHIBATA SUNAO
WAKAMATSU HIDETOSHI
SHIBATA SUNAO
Application Number:
JP23227691A
Publication Date:
February 26, 1993
Filing Date:
August 20, 1991
Export Citation:
Assignee:
OMI TADAHIRO
International Classes:
C23C14/35; C23C14/34; H01L21/302; H01L21/3065; H05H1/46; (IPC1-7): C23C14/35; H01L21/302; H05H1/46
Attorney, Agent or Firm:
Fukumori Hisao
Next Patent: PARALLEL PLATE PLASMA APPARATUS