APPARATUS FOR PRODUCING AND SUPPLYING GASEOUS FLUORINE
Document Type and Number:
Japanese Patent JP3725822
PROBLEM TO BE SOLVED: To provide an apparatus for producing and supplying gaseous fluorine which is disposed in a gas supply system of a semiconductor treating system and can back up the abnormality of the apparatus with inexpensive and safe constitution.
SOLUTION: The apparatus 30 for forming and supplying the gaseous fluorine disposed in the gas supply system 20 of the semiconductor treating system includes an electrolytic cell 34 for forming the gaseous fluorine and a cylinder 62 for storing the substitute gas selected from the group consisting of nitrogen fluoride, sulfur fluoride and chlorine fluoride. The electrolytic cell 34 and the cylinder 62 are connected to a gas switching section 56 for selectively supplying the gaseous fluorine from the electrolytic cell 34 and the substitute gas from the cylinder 62 to a gas use section. A controller 40 controls the gas switching section 56 so as to supply the substitute gas from the cylinder 62 to the gas use section when the abnormal state of the electrolytic cell 34 is detected by an electrolytic cell detector 36.
September 30, 2005
December 27, 2001
L'AIR LIQUIDE SA POUR L'ETUDE & L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
B01J4/00; C23C16/44; C25B1/24; C25B15/00; C25B15/02; H01L21/02; H01L21/302; (IPC1-7): C25B1/24; B01J4/00; C25B15/02; H01L21/02; H01L21/3065