PURPOSE: To efficiently progress the reproducing reaction of an etching soln. and, in combination with this, to increase the utilizing rate of ozone by connecting an ejector to the inside of a reproducing treatment line of an etching soln. and simultaneously pouring an ozonized gas and hydrochloric acid into the etching soln.
CONSTITUTION: An etching soln. (used soln.) extracted from a soln. storage tank 1a of an etching apparatus 1 is flowed in a reproducing treatment line 6. In the above flowing stage, an ozonized gas generated by an ozonizer 7 and hydrochloric acid stored in a hydrochloric acid storage tank 8 are simultaneously injected through an ejector 3. The ozonized gas and hydrochloric acid are brought into catalytic reaction with the etching soln., and the deteriorated etching soln. is reproduced. The reproduced etching soln. is refluxed from a deaerating tank 5 into an etching apparatus 1 in a natural flow-down system. An exhaust gas contg. surplus ions deaerated in the deaerating tank 5 is subjected to gas-liquid separation by a trap 13, is thereafter subjected to cleaning treatment by a scrubber 15 and is emitted into the air.
SHIROMIZU SHIGENORI
KAWAHARA YUJI
KUSAKA YUTAKA
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