To provide an apparatus for treating CMP slurry waste liquid and a method of treating CMP slurry waste liquid which can be compactly configured and can clear the wastewater standard at a low cost.
By using the apparatus 1 for treating CMP slurry waste liquid, a solid material-removing process for removing solid material with a special filter 2, a COD adsorption process for adsorbing and removing a surfactant and organic material which raises COD with activated carbon, by using a COD adsorption tower 3 and a Cu ion-removing process for removing Cu ions by using a Cu-removing ion exchange resin tower 4 are continuously performed by means of a slurry waste liquid flow path 5. Therein, on the upper stream side than the Cu ion-removing process, the solid material-removing process and the COD adsorption process are performed and, thereby, only CMP slurry waste liquid is continuously and individually treated by the slurry waste liquid flow path 5.
PUCHARAPARI SRINIVASULE REDDY
NAKAYAMA KENJI
NAKAYAMA KENJI
Next Patent: METHOD OF MANUFACTURING GAS CLEANING FILTER