Title:
アルゴン精製方法およびアルゴン精製装置
Document Type and Number:
Japanese Patent JP5101540
Kind Code:
B2
Abstract:
PURPOSE: A method and a device for purifying argon are provided to obtain argon with high purity and yield by using a PSA method. CONSTITUTION: Mixed gas including argon is inputted to a storage bath(10). The mixed gas is supplied from the storage bath to an absorbing tower(31A,31B,31C). The impurity of the mixed gas is absorbed in an absorbent when the pressure is relatively high inside the absorbing tower. Purified gas with much argon is extracted from the absorbing tower. The impurity is desorbed from the absorbent by decreasing the pressure inside the absorbing tower. The gas is extracted from the absorbing tower. The above processes are repeated in the absorbing tower.
More Like This:
Inventors:
Masanori Miyake
Koji Matsuura
Toshihiko Sumita
Koji Matsuura
Toshihiko Sumita
Application Number:
JP2009022311A
Publication Date:
December 19, 2012
Filing Date:
February 03, 2009
Export Citation:
Assignee:
Sumitomo Seika Co., Ltd.
International Classes:
C01B23/00; B01D53/04
Domestic Patent References:
| JP6039230A | ||||
| JP4280807A | ||||
| JP2007021486A | ||||
| JP1242120A | ||||
| JP4170309A | ||||
| JP11083309A |
Attorney, Agent or Firm:
Minoru Yoshida
Tatsuya Tanaka
Tatsuya Tanaka