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Title:
AROMATIC DIAZONIUM SALT AND ITS USE IN RADIATION-SENSITIVE MIXTURE
Document Type and Number:
Japanese Patent JPH0853401
Kind Code:
A
Abstract:

PURPOSE: To obtain a new aromatic diazonium salt useful as a positive type or negative type radiation-sensitive mixture to be used for covering a radiation- sensitive recording material and a photoreaction initiator.

CONSTITUTION: This is an aromatic or a heteroaromatic mono- or bisdiazonium 1,1,2,3,3,3-hexafluoropropanesulfonate such as 2,5-diethoxy-4-p- tolylmercaptobenzenediazonium 1,1,2,3,3,3-hexafluoropropanesulfonate. The exemplified compound is obtained by reacting 2,5-diethoxy-4-p- tolylmercaptobenzenediazonium with 1,1,2,3,3,3-hexafluoropropanesulfonic acid. The new compound is exposed to chemical radiation to form an acid. The new compound is combined with o-naphthoquinonediazide, etc., a melamine/ formaldehyde condensate, etc., and, if required, a binder (e.g. novolak, etc.), to give a radiation-sensitive mixture.


Inventors:
MATEIASU AIHIHORUN
GERUHARUTO BUURU
Application Number:
JP10643695A
Publication Date:
February 27, 1996
Filing Date:
April 28, 1995
Export Citation:
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Assignee:
HOECHST AG
International Classes:
C07D295/12; C07C245/20; C07C309/06; C07C323/48; C07D209/88; C07D295/135; G03C1/56; G03F7/016; G03F7/021; G03F7/09; (IPC1-7): C07C245/20; C07C309/06; C07C323/48; C07D209/88; C07D295/12
Attorney, Agent or Firm:
Kazuo Sato (2 outside)