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Title:
AROMATIC SULFONIUM SALT COMPOUND
Document Type and Number:
Japanese Patent JP2011105645
Kind Code:
A
Abstract:

To provide a photoacid generator having high developability, a cationic polymerization initiator having high curability, a resist composition and a cationically polymerizable composition using them.

An aromatic sulfonium salt compound represented by general formula (I) (wherein R1-R10 are each 1-18C alkyl which is unsubstituted or contains a substituent, or the like; R11-R17 are each 1-18C alkyl which is unsubstituted or contains a substituent, or the like; R18 is 1-18C alkyl which is unsubstituted or contains a substituent, or the like; and X1- is a monovalent anion) is used as a photoacid generator or a cationic polymerization initiator.


Inventors:
MAKABE YOSHIE
OKUYAMA YUTA
Application Number:
JP2009262367A
Publication Date:
June 02, 2011
Filing Date:
November 17, 2009
Export Citation:
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Assignee:
ADEKA CORP
International Classes:
C07D219/06; C01G30/00; C07C309/06; C08F4/00; C08G59/68; C09K3/00; G03F7/004
Domestic Patent References:
JPH09143212A1997-06-03
JPH09157350A1997-06-17
Foreign References:
WO1997047660A11997-12-18
Attorney, Agent or Firm:
Osamu Hatori