To perform angle correction of a prober frame when alignment between an array substrate and the prober frame has been completed.

The array inspection system performs array inspection by irradiating an array with an electron beam in a scanning manner and detecting secondary electrons emitted from the array by the irradiated electron beam. The array inspection system includes a stage which mounts an array under inspection and makes it rotatable with Z-axis direction as a rotation axis; an XY stage which supports the stage above and makes it movable in X, Y two-dimensional directions; the prober frame which is placed on the stage and has a prober pin which is in contact with an electrode of the array substrate; a lifting and lowering mechanism which makes the prober frame movable in the Z-axis direction and performs contact and separation, with respect to the prober pin and the electrode of the array substrate mounted on the stage; and a holding mechanism for holding the prober frame on the stage. The stage performs alignment of the direction between the array substrate and the prober frame with their mutual positional relationship maintained by the holding mechanism.