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Title:
ARRAY WITHOUT CONTACT POINT AND ISOLATION OF NONVOLATILE MEMORY CELL, EACH HAVING FLOATING GATE FOR CHARGE STORAGE, AND MANUFACTURING METHOD AND ITS USAGE
Document Type and Number:
Japanese Patent JP2005303294
Kind Code:
A
Abstract:

To provide a compact array of a floating gate nonvolatile memory cell without contact points and isolation, and to provide its manufacturing method and its operation mode.

An array of a floating gate nonvolatile memory cell without a contact point and an isolation has a plurality of memory cells (112), each having a floating gate (22) for storing a charge arrayed in many rows and columns on a semiconductor substrate (50). All bit lines (16) and source lines (20) are embedded, having no contact point. In the first embodiment, each cell is represented by a transistor having laminate of a transistor gate (14) and a control gate (24) connected to another auxiliary transistor. All arrays may be formed into a planar shape, or preferably, each floating gate transistor is located inside a trench (58), or each auxiliary transistor is located inside a trench.


Inventors:
LEE DANA
TRAN HIEU VAN
FRAYER JACK
Application Number:
JP2005108659A
Publication Date:
October 27, 2005
Filing Date:
April 05, 2005
Export Citation:
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Assignee:
SILICON STORAGE TECH INC
International Classes:
H01L21/8247; G11C16/04; H01L21/28; H01L21/336; H01L27/10; H01L27/115; H01L29/423; H01L29/788; H01L29/792; G11C16/14; (IPC1-7): H01L21/8247; H01L27/115; H01L29/788; H01L29/792
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Toshio Imajo
Takaki Nishijima