ARTICLE PROVIDED WITH OPTICAL ELEMENT AND MANUFACTURE THEREFOR

Japanese Patent JP3727358

B2

PURPOSE: To provide an optical element provided with an area locally substantially turned to a high refractive index.
CONSTITUTION: By a processing for exposing at least a part of glass to H2 or D2 (the partial pressure of H2 or D2 is more than 1 atmospheric pressure) at the temperature of 250°C or less and irradiating at least a part of an exposed part with the radiation 34 having chemical activity (UV in a typical case), unpredictably large standardized refractive index change (Δ>10-5), probably larger than 10-3) is obtained in oxide glass like high silica glass for instance. This method is used for the manufacture of the optical element including the area (or plural areas) of the high refractive index like an in-line refractive index in an optical waveguide, a planer optical waveguide or a phase diffraction grating, for instance.

Robert Michael Atkins
Paul Joseph Remaier
Victor Misurahi
Kenneth lee walker

JP10335093A

December 14, 2005

April 30, 1993

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AT&T CORP.

G02B6/02; C03B20/00; G02B6/00; G02B6/122; G02B6/124; G02B6/13; H01L21/00; G02B6/12; (IPC1-7): G02B6/122; C03B20/00; G02B6/00; G02B6/13; G02B6/16; H01L21/00

JP6090853A

SPIE International Workshop on Photoinduced Self-Organization Effects in Optical Fiber,Vol.1516pp.185-199(10-11May1991),G.Meltzet.al.
SPIE Fibre Optics’90,Vol.1314pp.223-233(24-26April1990),D.McStay
Optical Engineering,Vol.30 No.6(June1991)pp.780-789,P.J.Lemaire

Masao Okabe
Nobuaki Kato
Kazuo
Shinichi Usui
Ikuo Fujino
Takao Ochi
Teruhisa Motomiya
Norimichi Takanashi
Asahi Shinmitsu
Seiichiro Takahashi
Koji Yoshizawa

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