Title:
ASHING SYSTEM
Document Type and Number:
Japanese Patent JPH07122548
Kind Code:
A
Abstract:
PURPOSE: To prevent the rotation of wafer guide from being impeded by opposing the outer peripheral part closely to the end part of opening through an interval when a substrate stage is elevated to lift a substrate from a processing table in order to alter the direction of the substrate through rotation.
CONSTITUTION: A rotating wafer guide 11 has a beveled side face part 14 thus providing an opening 8 as wide as about 4mm with respect to a rotating mesh ring 5. Since it is exposed to plasma gas, the mesh ring 5 is prevented from coming into contact, at the opening part 8 thereof, with the side face part 14 of the guide even when the opening part 8 is deformed.
Inventors:
UMEKITA MASAMI
YAMAUCHI TOSHIYA
YAMAUCHI TOSHIYA
Application Number:
JP29268993A
Publication Date:
May 12, 1995
Filing Date:
October 28, 1993
Export Citation:
Assignee:
SONY CORP
International Classes:
H01L21/302; H01L21/027; H01L21/3065; (IPC1-7): H01L21/3065; H01L21/027
Attorney, Agent or Firm:
Kei Tanabe