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Title:
【発明の名称】酸化膜の形成方法
Document Type and Number:
Japanese Patent JP3122125
Kind Code:
B2
Abstract:
A method of forming an oxide film comprising at least: a first step of forming an oxide film on the surface of a substrate by bringing a solution of oxygen and/or a solution of oxygen-containing molecules into contact with the surface of the substrate on which the oxygen film is to be formed; and a second step of strengthening the bonding of oxygen and the atoms constituting the surface of the substrate in the oxide film by heat-treating the oxide film at a temperature higher than 20 DEG C in a gas phase of oxygen, molecules containing oxygen, or inert gas alone, or a mixture of two or more of them.

Inventors:
Tadahiro Ohmi
Mizuho Morita
Application Number:
JP50669990A
Publication Date:
January 09, 2001
Filing Date:
May 07, 1990
Export Citation:
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Assignee:
Tadahiro Ohmi
International Classes:
H01L21/316; (IPC1-7): H01L21/316
Attorney, Agent or Firm:
Hisao Fukumori



 
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