Title:
ASYMMETRIC COATING METHOD AND DEVICE FOR RIBBON-FORM SUPPORTER WITH SILICON
Document Type and Number:
Japanese Patent JPS5954691
Kind Code:
A
Abstract:
A method for continuously manufacturing silicon tapes which are predominantly coated on one side of the carrier, for solar cells. In an exemplary embodiment, a carrier body consisting of a graphite network is conducted vertically upwards through a guide channel situated in the floor of a silicon melt bath and travels through a crystallization region where the molten silicon crystallizes on the carrier body. The surfaces of the guide channel at each side of the carrier path in the vicinity of the crystallization region are wetted by the molten silicon and have different dimensions in a direction at right angles to the carrier path. As a result of the differential in surface tension forces at the two sides of the path, a meniscus is formed which is asymmetrical relative to the channel opening thereby causing asymmetrical coating of the carrier body.
Inventors:
YOOZEFU GURAAPUMAIYAA
RIHIARUTO FUARUKENBERUKU
HERUMUUTO FUERU
RIHIARUTO FUARUKENBERUKU
HERUMUUTO FUERU
Application Number:
JP15145383A
Publication Date:
March 29, 1984
Filing Date:
August 19, 1983
Export Citation:
Assignee:
SIEMENS AG
International Classes:
C30B15/34; C30B15/00; C30B29/06; (IPC1-7): C30B15/06; C30B29/06
Attorney, Agent or Firm:
Tomimura Kiyoshi