Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ASYMMETRICALLY SUBSTITUTED FLUORENE COMPOUND
Document Type and Number:
Japanese Patent JP2007169180
Kind Code:
A
Abstract:

To obtain an asymmetrically substituted fluorene compound which can present a new polymerization site around the central metal in a polymerization reaction, especially when derived to a metallocene complex.

The fluorene compound is expressed by formula (1), wherein the figures express the sites of substitution in the fluorene; R1 expresses a halogen atom, a substituted or nonsubstituted 1-20C alkyl; a substituted or nonsubstituted 6-20C aryl; a substituted or nonsubstituted 7-20C aralkyl; a substituted or nonsubstituted 1-20C alkoxy; a substituted or nonsubstituted 6-20C aryloxy; a substituted or nonsubstituted 7-20C aralkyloxy; a silyl group substituted with a substituted or nonsubstituted 1-20C hydrocarbon group or an amino group substituted with a substituted or nonsubstituted 1-20C hydrocarbon group; A expresses an alicyclic structure integrally formed with the 6 and 7 sites of the fluorene.


Inventors:
SENDA TAICHI
HANAOKA SHUSUKE
Application Number:
JP2005366015A
Publication Date:
July 05, 2007
Filing Date:
December 20, 2005
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C13/66; C07C2/50; C07C13/547; C07B61/00
Foreign References:
WO2006080475A12006-08-03
Attorney, Agent or Firm:
Takashi Kuboyama
Toru Nakayama
Masayuki Enomoto