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Title:
ASYMMETRY-RECOGNIZING SUBSTANCE AND PRODUCTION THEREOF
Document Type and Number:
Japanese Patent JPH09235196
Kind Code:
A
Abstract:

To obtain an asymmetry-recognizing substance improved in durability, stability and asymmetry-recognizing ability by irradiating fine quarts crystals with water-containing plasma to introduce hydroxyl groups on the surfaces of the crystals.

Argon gas is charged into a water-injected, two-neck flash to bubble the water, and the produced water-containing argon gas is charged into an eggplant type flask 106 through a gas-discharging tube 104 to which a high AC voltage is applied from an AC electric source 112. An electric discharge is generated between the inner tip part 104a of the eggplant type flack 106 and a box type electrode 110 to produce the water-containing plasma. Fine quartz crystals placed on the eggplant type flack 106 are irradiated with the produced water-containing plasma to introduce hydroxyl groups on the surfaces of the crystals 114. Thus, the asymmetry-recognizing substance produced by modifying the surfaces of the inorganic substance having an chiral spiral structure with the functional groups high in affinity for the target substances of asymmetry recognition is obtained.


Inventors:
YAO TAKESHI
KINOSHITA TOMOKI
Application Number:
JP7137496A
Publication Date:
September 09, 1997
Filing Date:
February 29, 1996
Export Citation:
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Assignee:
YAO TAKESHI
KINOSHITA TOMOKI
SHISEIDO CO LTD
International Classes:
C01B33/18; C30B29/18; (IPC1-7): C30B29/18; C01B33/18
Attorney, Agent or Firm:
Yuji Iwahashi