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Title:
ATOMIC-ABSORPTION PHOTOMETER USING ZEEMAN EFFECT
Document Type and Number:
Japanese Patent JPS5594144
Kind Code:
A
Abstract:

PURPOSE: To provide an atomic-absorption photometer using Zeeman effect which photometer incorporates a wide detecting limit by inclining the magnetic field direction of a magnetic field application unit at predetermined angle with respect to the direction perpendicularly crossing with the Blaise direction of diffraction grating in a spectroscope.

CONSTITUTION: Two deflected portions from a light source 1 are discriminated by a polarizing discriminator 2. A specimen to be analyzed is nucleated by a specimen nucleating unit 3. Then, predetermined magnetic field having a direction perpendicularly crossing with an optical path 6 is applied by a magnetic field application unit 4 to the nucleating unit 3. This magnetic field is converted through an incident slit 5, a collimating mirror 7, a diffraction grating 10, a camera mirror 8 and an output slit 11 by a detector 12 into an electric signal. Since the magnetic field direction 13 is set at 40° with respect to the direction of an axis 14 (in parallel with the rotary axis 9 of a rotating grating), the light absorbed by the atom in the unit 3 is a linearly polarized light having a vertical vibrating plane so that the absorbed light has the same intensity as the light not absorbed. Accordingly, even if the discriminator 2 is rotated, it does not generate alternating current component due to the polarizing characteristics.


Inventors:
OOISHI KOUNOSUKE
ARAI YOUJI
MAYAMA SHINJI
Application Number:
JP69879A
Publication Date:
July 17, 1980
Filing Date:
January 10, 1979
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
G01N21/31; (IPC1-7): G01N21/31