Title:
洗浄および表面処理のための原子状酸素およびオゾン装置
Document Type and Number:
Japanese Patent JP7342112
Kind Code:
B2
Abstract:
Embodiments described herein relate to oxygen cleaning chambers and a method of atomic oxygen cleaning a substrate. The oxygen cleaning chambers and method of atomic oxygen cleaning a substrate provide for generation of atomic oxygen in situ to oxidize materials on the surfaces of the substrate. The atomic oxygen cleaning chamber includes a chamber body, a chamber lid, a processing volume defined by the chamber body and the chamber lid, an UV radiation generator including one or more UV radiation sources, a pedestal disposed in the processing volume, and a gas distribution assembly. The pedestal has a processing position corresponding to a distance from the UV radiation generator to an upper surface of the pedestal. The gas distribution assembly is configured to be connected to an ozone generator to distribute ozone over the upper surface of the pedestal.
Inventors:
Wu Bangqiu
Duggan Eli
Duggan Eli
Application Number:
JP2021516781A
Publication Date:
September 11, 2023
Filing Date:
August 28, 2019
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/3065; H01L21/205; H01L21/304; H01L21/31; H01L21/316
Domestic Patent References:
| JP2015032757A | ||||
| JP2010010283A | ||||
| JP2002517082A | ||||
| JP2015103545A | ||||
| JP2014022655A | ||||
| JP2000323425A | ||||
| JP2013197255A | ||||
| JP2006114848A | ||||
| JP2005340665A | ||||
| JP2003047842A | ||||
| JP2018098240A |
Foreign References:
| US20130160946 |
Attorney, Agent or Firm:
Shinichiro Tanaka
▲吉▼田 和彦
Hiroyuki Suda
Fumiaki Otsuka
Takayoshi Nishijima
Hiroshi Uesugi
Naoki Kondo
Takeo Nasu
Nobuhiko Suzuki
▲吉▼田 和彦
Hiroyuki Suda
Fumiaki Otsuka
Takayoshi Nishijima
Hiroshi Uesugi
Naoki Kondo
Takeo Nasu
Nobuhiko Suzuki
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