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Title:
ATTACHMENT FOR SUBSTRATE OF DIFFERENT DIAMETER, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SUBSTRATE OR SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2012195562
Kind Code:
A
Abstract:

To allow a substrate of decreased size to be stored in a substrate housing device (hoop) constituting a transportation system corresponding to a large-diameter substrate.

An attachment for a substrate of different diameter includes an upper plate 401 and a lower plate 402 supported by a first support groove 16e capable of supporting an eight-inch wafer, and holding posts 403a-403c which are provided to the upper plate 401 and the lower plate 402 and contain a second support groove 404 capable of supporting a wafer 14, being a two-inch wafer (by way of a wafer holder 100 and a holder member 405 as require). The wafer 14 which is a two-inch wafer can be stored in a pod 16 corresponding to an eight-inch wafer, for sharing the pod 16 which is a transportation system, resulting in reduced cost of a semiconductor manufacturing apparatus. Gas supply nozzles are set away from the wafers 14, so that the reactive gas is sufficiently mixed before reaching the wafers 14, resulting in improved film-forming precision on the wafers 14.


Inventors:
ITO TAKESHI
TANAKA AKINORI
Application Number:
JP2012001176A
Publication Date:
October 11, 2012
Filing Date:
January 06, 2012
Export Citation:
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Assignee:
HITACHI INT ELECTRIC INC
International Classes:
C23C16/458; H01L21/673; H01L21/205
Attorney, Agent or Firm:
筒井 大和