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Title:
ATTENDANCE RATE MANAGEMENT SYSTEM AND ATTENDANCE RATE MANAGEMENT METHOD
Document Type and Number:
Japanese Patent JP2022091042
Kind Code:
A
Abstract:
To provide an attendance rate management system and an attendance rate management method, capable of promoting the limitation of the number of persons attending at a working place and the adjustment of an attendance time zone of a worker and avoiding a situation in which a worker easily gets infected with virus in the working place.SOLUTION: An attendance rate management system 1 comprises an entrance and exit management unit 10, an attendance rate management unit 20, and a plurality of entrance and exit control devices 32. The attendance rate management system further comprises: a history information acquisition unit which acquires identification information of workers and entrance and exit history information containing entrance and exit date and time information; a database which stores an upper-limit value of an attendance rate, attendance schedule information applied by a worker for approval, identification information of a worker, and information on an approval situation of attendance availability to the attendance schedule; and an attendance rate management unit which manages the attendance rate. The attendance rate management unit calculates an attendance rate on the basis of the entrance and exit history information, attendance schedule information, identification information, and information on the approval situation. When an upper-limit value of a predetermined attendance rate is exceeded, the attendance rate management unit notifies a person in charge of managing an attendance schedule of workers that an attendance rate in a predetermined group exceeded the upper-limit value.SELECTED DRAWING: Figure 1

Inventors:
HONDA DAISUKE
CHIBA JUNICHI
Application Number:
JP2020203730A
Publication Date:
June 20, 2022
Filing Date:
December 08, 2020
Export Citation:
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Assignee:
HITACHI BUILDING SYST CO LTD
International Classes:
G06Q10/06; G07C1/00
Attorney, Agent or Firm:
Shinto International Patent Office