Title:
AUTOMATED PHOTOLITHOGRAPHIC WORK CELL
Document Type and Number:
Japanese Patent JPH022605
Kind Code:
A
Abstract:
PURPOSE: To reduce a wafer transfer mechanism by providing a single robot arm which transfers a semiconductor wafer to one of work stations used for the semiconductor wafer photography process of the semiconductor wafer or from it. CONSTITUTION: A work cell handling a semiconductor wafer in a clean room environment is provided with an enclosure providing a work space in a dustless state, stations 10-15 used for the photolithography process of the semiconductor wafer, a single robot arm 16 for transferring the semiconductor wafer to one of the work stations 10-15 or from it and a controller 19 for managing the operation of the robot arm 16 and controlling the total operation of the work cell by operating the process stations 10-15. The robot arm 16 takes up the wafer with an arm end effector 18 while it rotates on a stage 17 and it is transferred to the next process station.
Inventors:
REONAADO DABURIYU FUOSUTAA
HARORUDO DABURIYU SARIBAN
JIEIMUZU AARU MOAARANDO
HARORUDO DABURIYU SARIBAN
JIEIMUZU AARU MOAARANDO
Application Number:
JP32473688A
Publication Date:
January 08, 1990
Filing Date:
December 22, 1988
Export Citation:
Assignee:
TEXAS INSTRUMENTS INC
International Classes:
G03F7/20; H01L21/00; H01L21/027; H01L21/30; H01L21/677; (IPC1-7): H01L21/027; H01L21/30; H01L21/68
Domestic Patent References:
| JPS6084819A | 1985-05-14 | |||
| JPS61123150A | 1986-06-11 | |||
| JPS55141570A | 1980-11-05 | |||
| JPS60175411A | 1985-09-09 | |||
| JPS60238134A | 1985-11-27 |
Attorney, Agent or Firm:
Akira Asamura (2 outside)
Next Patent: JPH022606