PURPOSE: To obtain the automatic exposing machine which automatically position a substrate and a mask pattern with small deviation.

CONSTITUTION: This automatic exposing machine 50 which has a positioning mechanism for fixing the substrate 10 on the exposing machine 50, an XYθ variable table which positions an exposure pattern 20 on the substrate 10, and a detecting mechanism which detects the position deviation between the substrate 10 and exposure pattern 20 has a positioning stage 32 in front of an exposure stage 31 and is provided with a mechanism 33 which detects the position deviation between the substrate 10 and exposure pattern 20 at the exposure stage 31 to judge whether or not exposure is possible and discharges the substrate 10 after or without exposure. Further, the position deviation between the substrate 10 and exposure pattern 20 which is detected at the exposure stage 31 is fed back to the positioning stage 32 and a correcting mechanism 34 corrects the position deviation previously by moving the XYθ variable table.