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Patent Searching and Data


Title:
ガス放電レーザのための自動ガス制御システム
Document Type and Number:
Japanese Patent JP2005524996
Kind Code:
A
Abstract:
An automatic F2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor for monitoring the F2 consumption rates through the operating life of the laser system. These consumption rates are used by a processor programmed with an algorithm to determine F2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F2 controls for a two-chamber MOPA laser system.

Inventors:
Rule John A
Hoffman Thomas
Morton Richard G
Brown Daniel Jay W
Fleurov Vladimir Bee
Trinto choke fedor
Toshihiko Ishihara
Aashoff Alexander Eye
Whitak Christian Jay
Application Number:
JP2004504354A
Publication Date:
August 18, 2005
Filing Date:
May 05, 2003
Export Citation:
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Assignee:
Cymer Incorporated
International Classes:
H01L21/027; G03F7/20; H01S3/036; H01S3/134; H01S3/22; H01S3/223; H01S3/225; H01S3/23; H01S3/041; H01S3/08; H01S; (IPC1-7): H01S3/036; H01L21/027; H01S3/134
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Toshio Imajo
Takaki Nishijima