Title:
AUTOMATIC OXIDATION REDUCTION SYSTEM BY COLLOID SOLUTION OF HYDROGEN GAS AND OXYGEN GAS DISSOLVED UNDER VACUUM AND PRESSURE
Document Type and Number:
Japanese Patent JP3843361
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an oxidation-reduction treatment technique by gas-liquid colloid of hydrogen and oxygen.
SOLUTION: In a solution reducing technology having a three-step agitating and dissolving process comprising vacuum agitation, high speed agitation, and pressure agitation, hydrogen gas is fed to flowing liquid after filtration, and excessively suspended as fine bubbles so that its concentration becomes equal to or more than the gas solubility of a solution. In order to create strong reduction power as a colloid solution containing gas and liquid, the hydrogen gas is injected by a gas nozzle in a vacuum tank. In a vacuum agitation tank, a fixed vortex flow generating stirrer installed in the tank crushes gas bubbles by vacuum agitation combining vacuum agitation based on rotating vortex flow and high speed agitation in a high-speed rotary pump, thereby forming fine bubbles of the hydrogen gas. In a pressure agitation tank set after the vacuum agitation tank, the fine bubbles fed from the high speed rotary pump are momentarily crushed by a fixed vortex flow generating stirrer installed in the tank, and homogenized while compressing and atomizing the bubbles by the pressure agitation to make them finer. The solution is made to become a supersaturation state of gas and liquid, which dissolves the bubbles to form the colloid containing gas and liquid, thereby creating a strong reduction effect of the solution.
Inventors:
Uemura Chika
Application Number:
JP2003158698A
Publication Date:
November 08, 2006
Filing Date:
April 28, 2003
Export Citation:
Assignee:
Information Science Research Institute, Inc.
International Classes:
C02F1/68; E02B3/00; B01F25/64; C02F1/70; C02F1/72; B01F; (IPC1-7): C02F1/68; B01F1/00; B01F3/04; E02B3/00
Domestic Patent References:
| JP856632A | ||||
| JP200319426A | ||||
| JP5916527A | ||||
| JP2001314740A |
Attorney, Agent or Firm:
Kyosei International Patent Office