AUXILIARY FIGURE USED FOR LITHOGRAPHIC PROJECTION

Title:

AUXILIARY FIGURE USED FOR LITHOGRAPHIC PROJECTION

Document Type and Number:

Japanese Patent JP2002090979

Kind Code:

A

Abstract:

To provide an improved mask through which such isolated regions as high density figures are accurately formed and can be projected at prescribed positions without deformation when the high density figures such as contact holes of an integrated circuit are projected on a substrate using a lithographic projector.

A mask with arrays of isolated figures 110 which represent contact holes is prepared and plural auxiliary figures 151, 152 which do not remain on a developed substrate because they are smaller than the limiting size of the mask patterns and the limit of resolution of a lithography machine to be used are disposed in the arrays in such a way as to increase the symmetry of the arrays. As a result, aberration, particularly odd aberration in aerial images of the mask patterns is reduced by a diffraction effect and the mask is improved.

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Inventors:

BASELMANS JOHANNES JACOBUS MET
SCHLUTER MARKUS
FLAGELLO DONIS GEORGE
SOCHA ROBERT JOHN

Application Number:

JP2001218954A

Publication Date:

March 27, 2002

Filing Date:

July 19, 2001

Export Citation:

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Assignee:

ASM LITHOGRAPHY BV
ASML MASKTOOLS BV

International Classes:

G03F1/00; G03F7/20; H01L21/027; (IPC1-7): G03F1/08; G03F7/20; H01L21/027

Attorney, Agent or Firm:

Akira Asamura (3 outside)

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