BACTERIA REMOVING DEVICE

Japanese Patent JP3908336

B2

PROBLEM TO BE SOLVED: To prevent the generation, etc. of a malodor due to the excess of chlorine and to prevent water from being fed in which a bacteria is not removed when a flow rate is low as to water feed from a water feeding pump.
SOLUTION: Water is fed to a cock 18 from an electrical well pump 14 through a bacteria removing device 20. In an injecting pump device 50, when the flow rate of the feedwater is more than a prescribed value, the number of rotation of an injection pump 52 is controlled with a controlling device 58 in proportion to a flow rate signal of the feedwater from a flow mater 30. A chemical liquid of the flow rate in almost proportion to the number of rotation of the injection pump 52 is injected into a mixing tank 60 from a chemical liquid tank 40 with the injection pump 52 to keep a chlorine concn. in the water flowing out from the clock 18 to almost constant value, for example to 1 ppm. Further, when the flow rate of the feedwater is less than the prescribed value, the chemical liquid of a constant flow rate is injected without relation to the flow rate of the feedwater to inject the chlorine and to prevent the water from being fed in which a bacteria is not removed even in the case so that a flow rate signal having a low flow rate as the flow rate is less than detection error of the flow meter 30 is not originated. In this way, a safety of the feedwater is improved.

Yoshiyuki Itaya
Makiyama Tatsunori
Kiyohiro Matsue
Shozo Yamaguchi
Shigeru Suganuma

JP17354297A

April 25, 2007

June 30, 1997

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Mitsubishi Electric Corporation
Kawamoto Manufacturing Co., Ltd.

C02F1/50; C02F1/76; (IPC1-7): C02F1/50; C02F1/50; C02F1/50; C02F1/50; C02F1/50; C02F1/76

JP1159097A
JP54028444A
JP49016177Y1
JP5309373A
JP5293472A

Toshihide Kodama
Masuo Oiwa
Takenaka Ikuo
Keigo Murakami

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