To provide a barrier film having excellent gas barrier properties for preventing the permeation of an oxygen gas or the like.

This barrier film is composed of at least a base material film and the barrier layer provided on one side of the base material film. Further, the gas barrier layer comprises a metal oxide layer by a physicochemical vapor phase growing method, and at least two silicon oxide layers, which are formed by using at least two film-forming mixed gas compositions prepared by using at least two film-forming chambers and changing the mixing ratio of respective gas components of the film-forming mixed gas composition containing a film-forming monomer gas comprising at least one kind of an organosilicon compound, an oxygen gas and an inert gas at each of film forming chambers by a plasma chemical vapor phase growing method. Further, the respective silicon oxide layers contain a carbon atom and are different in the content of carbon.