Title:
シームループを有する抄紙用フェルト用基布およびその製造方法
Document Type and Number:
Japanese Patent JP6739176
Kind Code:
B2
Abstract:
The object is to provide a base fabric for a papermaking felt wherein there is no damage to the MD yarns of the seam loops and a method of producing the same. This is achieved by a base fabric for a papermaking felt wherein seam loops are formed by MD yarns, which is made from MD yarns of the felt running direction (MD) and CD yarns of the felt cross-direction (CD); wherein the seam loops are obtained by removing CD yarns from a part other than the CD yarn no-removal part of a woven fabric comprising a seam loop region having the CD yarn no-removal part, and by moving CD yarns of the CD yarn no-removal part and CD yarns from between the CD yarn no-removal part and the part in which the CD yarns have been removed in the direction of the part in which the CD yarns have been removed, and wherein the strength of the MD yarns of the part in which the CD yarns have been removed is lower than the strength of the MD yarns of the CD yarn no-removal part.
Inventors:
Yasuyuki Ogiwara
Application Number:
JP2016008901A
Publication Date:
August 12, 2020
Filing Date:
January 20, 2016
Export Citation:
Assignee:
Ichikawa Co., Ltd.
International Classes:
D21F7/10; D03D15/68; D06H7/14
Domestic Patent References:
| JP2011513599A | ||||
| JP61146897A | ||||
| JP2004512441A | ||||
| JP1306696A |
Foreign References:
| US8353252 |
Attorney, Agent or Firm:
Kiyoji Kuzuwa