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Title:
BASE MATERIAL FOR RADIATION GRAFT POLYMERIZATION AND RAW MATERIAL FOR FILTER
Document Type and Number:
Japanese Patent JP2007092269
Kind Code:
A
Abstract:

To provide a polymeric base material for radiation graft polymerization introducing a functional group to a polymeric fiber base material by using the radiation graft polymerization and improving radiation graft polymerization in the radiation graft polymerization to a woven or nonwoven fabric.

The polymeric base material in the form of a woven or nonwoven fabric for radiation graft polymerization, is characterized by comprising a woven or nonwoven fabric comprised of polymer fibers and a polymeric reinforcing agent which has higher strength and exhibits a lower rate for radiation graft polymerization than those with respect to the polymer fibers. The woven or nonwoven fabric material comprising polymer monofilament having been subjected to a radiation graft polymerization treatment, is characterized in that the surface portion of the monofilament is graft-polymerized by radiation and the central portion thereof remains ungrafted. The method for the radiation graft polymerization treatment of a fabric base material is characterized by a first process for irradiating the woven fabric or nonwoven fabric base material with electron beams in a nitrogen atmosphere, a second process for bringing the base material into contact with a prescribed amount of a monomer in the nitrogen atmosphere, and a third process for graft-polymerizing the monomer in the nitrogen atmosphere.


Inventors:
SUGO TAKANOBU
FUJIWARA KUNIO
KAWAZU HIDEO
MASUBUCHI TERUO
SUGANO JUNICHI
ENDO NAOTOSHI
AKAHORI SHOJI
Application Number:
JP2006281576A
Publication Date:
April 12, 2007
Filing Date:
October 16, 2006
Export Citation:
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Assignee:
EBARA CORP
JAPAN ATOMIC ENERGY AGENCY
International Classes:
D06M14/26; D06M15/273; D06M17/00
Attorney, Agent or Firm:
Kazuo Shamoto
Shinjiro Ono
Tadahiko Kurita
Shurin Sakurai
Shinya Hosokawa
Minako Matsuyama
Takako Koiso
Mitsutoshi Nakamura