Title:
PLASMA TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP3158715
Kind Code:
B2
Abstract:
PURPOSE: To enable plasma to be uniformly irradiated to a treatment object having a large treatment area.
CONSTITUTION: A long and narrow window section 18b is formed on the side wall of a plasma chamber 18, and a treatment object 20 is laid inside the window section 18b. A slit 16b is formed on the E plane 16a of a rectangular waveguide 16 in an axial direction. With the lengthwise directions of the slit 16b and the window section 18b aligned with each other, the waveguide 16 is mounted on the plasma chamber 18, thereby coupling the slit 16b to the window section 18b. The coupling section of the slit 16b and window section 18b is sealed in vacuum state with a quartz glass plate 19.
Inventors:
Akira Ishii
Shoichiro Minomo
Michio Taniguchi
Masato Sugiu
Shoichiro Minomo
Michio Taniguchi
Masato Sugiu
Application Number:
JP25366692A
Publication Date:
April 23, 2001
Filing Date:
August 28, 1992
Export Citation:
Assignee:
Daihen Co., Ltd.
International Classes:
C23C14/22; H01J37/32; H05H1/46; (IPC1-7): H05H1/46; C23C14/22
Domestic Patent References:
| JP6411403A |
Attorney, Agent or Firm:
Hiroshi Nakai
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