Title:
BEAM DRAWING DEVICE
Document Type and Number:
Japanese Patent JPS6041225
Kind Code:
A
Abstract:
PURPOSE:To enable determination of optimum development time and improve yield of products by calculating area ratio of irradiated part versus non-irradiated part by a drawing beam on the substrate on which a pattern is drawn simultaneously with the drawing. CONSTITUTION:The substrate 2 on which a pattern is drawn is placed on an XY stage. The first condenser lens 4 focuses electrons from an electron gun 3. A blanking electrode 5 controls on-off of electron beam irradiation on the substrate 2. Between the electrode 5 and the substrate 2, the second condenser lens 6 is installed. A deflection electrode 7 scans the electron beam in X and Y directions on the substrate 2. An intermediate aperture 8 breaks the deflected electron beam when the electrode 5 is applied with blanking voltage. An integrated circuit 10 integrates a signal current of the aperture 8. The integrated circuit 10 operates corresponding to each synchronous pulses PS, PE from a synchronous circuit 20. The output is A/D converted 21 and a pattern ratio of irradiation versus non-irradiation is calculated in the CPU of a beam drawing device.
Inventors:
KOMATSU BUNROU
Application Number:
JP14997883A
Publication Date:
March 04, 1985
Filing Date:
August 17, 1983
Export Citation:
Assignee:
TOSHIBA KK
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/30; G03F7/20
Attorney, Agent or Firm:
Takehiko Suzue
Previous Patent: The lubricating oil composition and clock for clocks
Next Patent: CHARGED PARTICLE RAY DEVICE
Next Patent: CHARGED PARTICLE RAY DEVICE