Title:
BEAM HOMOGENIZER, LASER IRRADIATOR, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2005129889
Kind Code:
A
Abstract:
To provide a beam homogenizer capable of forming a rectangular shaped beam spot whose energy distribution in the long side direction is uniform on a surface to be irradiated without using optical lens to which high manufacturing accuracy is required.
In a beam homogenizer, a beam spot on a surface to be irradiated is formed in a rectangular shape having an aspect ratio of ≥ 10, preferably, ≥ 100. The beam homogenizer has an optical waveguide for uniformizing the rectangular shaped energy distribution in the long side direction.
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Inventors:
TANAKA KOICHIRO
MORIWAKA TOMOAKI
MORIWAKA TOMOAKI
Application Number:
JP2004129438A
Publication Date:
May 19, 2005
Filing Date:
April 26, 2004
Export Citation:
Assignee:
SEMICONDUCTOR ENERGY LAB
International Classes:
G02B19/00; G02F1/1345; G02F1/1368; H01L21/20; H01L21/268; (IPC1-7): H01L21/268; G02B19/00; G02F1/1345; G02F1/1368; H01L21/20
Domestic Patent References:
JPH08327942A | 1996-12-13 | |||
JPH09234579A | 1997-09-09 | |||
JPH11212021A | 1999-08-06 | |||
JP2001007045A | 2001-01-12 | |||
JPH09275081A | 1997-10-21 | |||
JP2002141302A | 2002-05-17 | |||
JPH0727993A | 1995-01-31 |
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