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Title:
BEAM HOMOGENIZER, LASER IRRADIATOR, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2005129889
Kind Code:
A
Abstract:

To provide a beam homogenizer capable of forming a rectangular shaped beam spot whose energy distribution in the long side direction is uniform on a surface to be irradiated without using optical lens to which high manufacturing accuracy is required.

In a beam homogenizer, a beam spot on a surface to be irradiated is formed in a rectangular shape having an aspect ratio of ≥ 10, preferably, ≥ 100. The beam homogenizer has an optical waveguide for uniformizing the rectangular shaped energy distribution in the long side direction.


Inventors:
TANAKA KOICHIRO
MORIWAKA TOMOAKI
Application Number:
JP2004129438A
Publication Date:
May 19, 2005
Filing Date:
April 26, 2004
Export Citation:
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Assignee:
SEMICONDUCTOR ENERGY LAB
International Classes:
G02B19/00; G02F1/1345; G02F1/1368; H01L21/20; H01L21/268; (IPC1-7): H01L21/268; G02B19/00; G02F1/1345; G02F1/1368; H01L21/20
Domestic Patent References:
JPH08327942A1996-12-13
JPH09234579A1997-09-09
JPH11212021A1999-08-06
JP2001007045A2001-01-12
JPH09275081A1997-10-21
JP2002141302A2002-05-17
JPH0727993A1995-01-31