Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
BEAM SHAPING ELEMENT FOR USE IN A LITHOGRAPHIC SYSTEM
Document Type and Number:
Japanese Patent JP2007150345
Kind Code:
A
Abstract:

To provide a beam shaping element which changes an input beam having an un-homogenous space energy distribution into an output beam having an predetermined angle energy distribution in a predetermined plane, and is used in a lithography system.

This beam shaping element is provided with a substrate having a structure formed by lithography technology on its surface, and the structure changes the input beam into the output beam having the predetermined angle energy distribution in the predetermined plane of the lithography system. The structure forms the angle energy distribution by having various space periodic structures. The substrate is divided into a plurality of facet regions. Each facet region is formed as a sufficient large region so as to include contents of substantially all space periodic structures of the predetermined whole angle energy distribution in the predetermined plane. A light beam reaching each position is propagated from at least two facet regions among the plurality of facet regions.


Inventors:
Kathman, Alan D.
Feldman, Michael R.
Application Number:
JP2007000014833
Publication Date:
June 14, 2007
Filing Date:
January 25, 2007
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
DIGITAL OPTICS CORP
International Classes:
H01L21/027; B23K26/06; G02B5/02; G02B5/18; G02B5/32; G02B27/09; G02F1/01; G03F7/20; G03H1/08; H04B10/04
Attorney, Agent or Firm:
山田 卓二
田中 光雄