To provide a conductive beam structure with high hardness and high toughness.

A beam structure array 100 contains a plurality of beam structures 110. Each beam structure 110 contains a supporting 112, an intermediate supporting part 114 thinner than the supporting part 112, a cantilever part 116 extending from the intermediate supporting parts 114 and a protruding part 118 formed on the tip of the cantilever part 116. The supporting part 112 of each beam structure 110 is connected to a frame 102 with three connection members 104. The form of cantilever part 116 has length of 1mm, a width of 250μm and a thickness of 15μm, and the protruding part 118 has height of 2.8μm. The beam structure array 100 is formed out of the same amorphous alloy material, and, for example, with the use of superplastic flow in a supercooled liquid area that the amorphous alloy has, manufacture is performed with what is called a forging method.