Title:
BEAUTY MASK
Document Type and Number:
Japanese Patent JP2002172022
Kind Code:
A
Abstract:
To provide a beauty mask which is used to cover a face not only to give activity to the skin but also prevent acne and rough skin and can prevent atopic dermatitis.
This mask comprises an upper cloth 1, a middle cloth 2, and a lower cloth 3 mutually sowed together. Holes 5a, 5b, 7 are respectively provided at positions of eyes and the mouth. The central part of the middle cloth 2 is loosened for the position of the nose. The substrate 11 comprising plant carbon fiber is used as the backside or the middle layer in contact with the skin for the cloths 1, 2, 3.
Inventors:
AKIMOTO KAZUHIDE
MATSUI YOSHIHIRO
MATSUI YOSHIHIRO
Application Number:
JP2000373747A
Publication Date:
June 18, 2002
Filing Date:
December 08, 2000
Export Citation:
Assignee:
APPAREL MACH SERVICE KK
E TEC KK
E TEC KK
International Classes:
A45D44/22; (IPC1-7): A45D44/22
Domestic Patent References:
JP14017381Y | ||||
JP2000197711A | 2000-07-18 |
Attorney, Agent or Firm:
Hirasaki Hikoharu
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