Title:
BINARY POROUS SILICA AND METHOD FOR MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2006213558
Kind Code:
A
Abstract:
To provide a binary porous silica having a large nano-pore size, a high breakage load value, and a reduced pulverization at the time of filling or using, and a method for manufacturing above-mentioned binary porous silica with good reproducibility and efficiently.
The binary porous silica is characterized in that nano-pores having the mean diameter in a range of 5-50 nm and macro-pores having the mean diameter in a range of 0.1-20 μm are formed therein, and in that the volume of the nano-pores is in the range of 0.4-1.5 cm3/g and the volume of the macro-pores is in the range of 0.6-2.0 cm3/g, and further in that the compressive strength is in the range of 10 kg/cm2 or higher and 20 kg/cm2 or lower.
Inventors:
SATO TOMOJI
TAKAHASHI RYOJI
ISHIZUKI MASASHIGE
MATSUTANI KATSUHIRO
MIKAMI NAOKI
TAKAHASHI RYOJI
ISHIZUKI MASASHIGE
MATSUTANI KATSUHIRO
MIKAMI NAOKI
Application Number:
JP2005027064A
Publication Date:
August 17, 2006
Filing Date:
February 02, 2005
Export Citation:
Assignee:
UNIV CHIBA
TOKUYAMA CORP
TOKUYAMA CORP
International Classes:
C01B33/157; B01J20/10; B01J20/28; B01J21/08; B01J32/00; B01J35/10
Domestic Patent References:
JP2004285611A | 2004-10-14 | |||
JP2004250387A | 2004-09-09 | |||
JP2002080216A | 2002-03-19 | |||
JP2002080217A | 2002-03-19 |
Foreign References:
WO2002085785A1 | 2002-10-31 |