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Title:
BLANK PHOTOMASK AND METHOD FOR MANUFACTURING PHOTOMASK USING THE SAME
Document Type and Number:
Japanese Patent JP2005062884
Kind Code:
A
Abstract:

To provide a blank photomask and a method for manufacturing a photomask using the same.

The blank photomask comprises: a chromium light shielding layer formed on a light-transmissive substrate; a hard mask layer comprising a conductive substance formed thereon with an etching selectivity of at least 3:1 or higher with respect to the chromium light shielding layer against an etching gas mixture containing chlorine gas and oxygen gas; and a resist layer formed on the hard mask layer. Further, a phase inversion layer can be interposed between the light-transmissive substrate and the chromium light shielding layer. As for the hard mask layer, Mo or MoSi is preferably used.


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Inventors:
LEE JEONG-YUN
YIM KA-SOON
HWANG JAE-HEE
JANG IL-YONG
Application Number:
JP2004235965A
Publication Date:
March 10, 2005
Filing Date:
August 13, 2004
Export Citation:
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Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
B32B9/00; B32B15/00; B32B17/06; G03F1/32; G03F1/58; G03F7/20; G03F9/00; H01L21/027; H01L21/3065; (IPC1-7): G03F1/08; G03F7/20; H01L21/027; H01L21/3065
Domestic Patent References:
JPH06138650A1994-05-20
JPH04371955A1992-12-24
JPS5741638A1982-03-08
JPH0553290A1993-03-05
JP2001033940A2001-02-09
JPS63173051A1988-07-16
JPH0749558A1995-02-21
JPS61138256A1986-06-25
JPH1165095A1999-03-05
JPH11271958A1999-10-08
Attorney, Agent or Firm:
Mikio Hatta
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Toshifumi Fujii



 
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