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Title:
BLANK FOR PHOTOMASK AND PHOTOMASK
Document Type and Number:
Japanese Patent JP2002287330
Kind Code:
A
Abstract:

To provide a blank small in film stress, capable of reducing warpage of a substrate before and after film forming and capable of forming an accurate pattern without any distortion.

In the photomask blank having at least one light-shielding film and at least one antireflection film on a transparent substrate, the film stress in the whole films of the light-shielding film and the antireflection film is ≤0.2 GPa and the variation in the warpage of the substrate before and after forming the light-shielding film and the antireflection film is ≤0.2 μm.


More Like This:
WO/2010/050447PHOTOMASK BLANK, PHOTOMASK AND METHOD FOR MANUFACTURING THE PHOTOMASK
JPH06242596SUBSTRATE WITH LIGHT SHIELDING FILM AND ITS PRODUCTION
Inventors:
KANEKO HIDEO
INAZUKI SADAOMI
OKAZAKI SATOSHI
Application Number:
JP2002055314A
Publication Date:
October 03, 2002
Filing Date:
April 25, 2000
Export Citation:
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Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F1/46; G03F1/50; G03F1/54; G03F1/68; H01L21/027; (IPC1-7): G03F1/08; G03F1/14; H01L21/027
Domestic Patent References:
JPH08202017A1996-08-09
JPH0695362A1994-04-08
JPH08286359A1996-11-01
JPH04371955A1992-12-24
JPH06308713A1994-11-04
JPH0728224A1995-01-31
JPH10183334A1998-07-14
JPH10183333A1998-07-14
JPH0913165A1997-01-14
Attorney, Agent or Firm:
Takashi Kojima (1 person outside)



 
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