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Title:
BLOCK POLYMER CONTAINING RADICAL POLYMERIZATION SEGMENT AND CATIONIC POLYMERIZATION SEGMENT, ITS MOLDED ARTICLE, COMPOSITION AND PRODUCTION
Document Type and Number:
Japanese Patent JP08092336
Kind Code:
A
Abstract:

PURPOSE: To readily obtain the subject polymer useful as a molding material by a single-stage reaction by reacting a radically polymerizable monomer with a cationically polymerizable monomer in the presence of a radical initiator.

CONSTITUTION: This polymer containing a radical polymerization segment and a cationic polymerization segment is obtained by simultaneously polymerizing (C) a radically polymerizable monomer and (D) a cationically polymerizable monomer by using (A) a radical initiator and (B) an electron acceptor simultaneously or in a time lag. In the case of the polymerization in a time lag, the components C is polymerized first and then the component D is polymerized. Preferably a styrenic monomer such as styrene, p-methoxystyrene or α- methylstyrene is preferably used as the component C, butyl vinyl ether, cyclohexene oxide or caprolactam as the component D, azobisisobutyronitrile as the component A and an onium salt (especially diphenyliodonium hexafluorophosphate) as the component B.


Inventors:
Kamaike, Kanji
Morishima, Yotaro
Kajiwara, Atsushi
Kaku, Kaisei
Application Number:
JP1994000254478
Publication Date:
April 09, 1996
Filing Date:
September 24, 1994
Export Citation:
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Assignee:
NIPPON P M C KK
International Classes:
C08F293/00; C08F297/00; C08G81/02; C08F293/00; C08F297/00; C08G81/00; (IPC1-7): C08F293/00; C08G81/02