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Title:
BLUE-VIOLET LASER PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2008152285
Kind Code:
A
Abstract:

To provide a photosensitive composition which has excellent sensitivity to blue-violet laser light and developing property when used for forming a resist image and results in easy peeling and removing of a resist image after processing the resist, and in particular, to provide a blue-violet laser photosensitive composition suitable to be used for direct drawing by blue-violet laser light.

The blue-violet laser photosensitive composition contains: (A) a carboxyl group-containing copolymer containing a structural repeating unit derived from ethylenically unsaturated carboxylic acids, alkyl (meth)acrylates and styrenes; (B) an ethylenically unsaturated compound; (C) a photopolymerization initiator; and (D) a sensitizing dye having the absorption maximum in the wavelength region of 355-430 nm.


Inventors:
TOSHIMITSU ERIKO
MIZUKAMI JUNJI
Application Number:
JP2008034492A
Publication Date:
July 03, 2008
Filing Date:
February 15, 2008
Export Citation:
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Assignee:
MITSUBISHI CHEM CORP
NIPPON SYNTHETIC CHEM IND
International Classes:
G03F7/033; G03F7/004; G03F7/029; H01L21/027
Domestic Patent References:
JPH07248621A1995-09-26
JPH0776663A1995-03-20
JP2002156756A2002-05-31
JPH09204044A1997-08-05
JP2004348114A2004-12-09
JP2004301996A2004-10-28
JP4178916B22008-11-12
JP2005122123A2005-05-12
Attorney, Agent or Firm:
Tsuyoshi Shigeno