Title:
基板処理方法および基板処理装置
Document Type and Number:
Japanese Patent JP6933960
Kind Code:
B2
Abstract:
A substrate processing method includes a substrate rotating step of rotating a substrate in a horizontal posture, a processing liquid supplying step of supplying a processing liquid to an upper surface of the substrate which is being rotated in the substrate rotating step, a liquid film state monitoring step of monitoring a state of a liquid film formed on the upper surface of the substrate by the processing liquid supplied to the upper surface of the substrate, and a substrate rotational speed changing step of changing rotational speed of the substrate in accordance with the state of the liquid film monitored in the liquid film state monitoring step during execution of the processing liquid supplying step.
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Inventors:
Takahiro Yamaguchi
Application Number:
JP2017220076A
Publication Date:
September 08, 2021
Filing Date:
November 15, 2017
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/306; H01L21/304
Domestic Patent References:
| JP2016040812A | ||||
| JP2010010242A | ||||
| JP2003257833A | ||||
| JP2015204427A | ||||
| JP2010062259A |
Attorney, Agent or Firm:
Patent Business Corporation Ai Patent Office