Title:
基板処理方法および基板処理装置
Document Type and Number:
Japanese Patent JP6993806
Kind Code:
B2
Abstract:
A substrate processing method includes a substrate holding step of horizontally holding a substrate having a first major surface and a second major surface at an opposite side of the first major surface, a coating film forming step of supplying a coating agent to the first major surface to form a sublimating coating film which covers the first major surface, and a coating film cleaning step of cleaning a front surface of the coating film.
Inventors:
Hitoshi Nakai
Yasunori Kanamatsu
Yasunori Kanamatsu
Application Number:
JP2017148111A
Publication Date:
January 14, 2022
Filing Date:
July 31, 2017
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/304
Domestic Patent References:
| JP2008140818A | ||||
| JP2012243869A | ||||
| JP2015065396A | ||||
| JP2016103595A | ||||
| JP2015149410A | ||||
| JP2013042093A | ||||
| JP2013016699A |
Foreign References:
| US20160099160 |
Attorney, Agent or Firm:
Patent Business Corporation Ai Patent Office
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