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Title:
BORON SELECTIVELY ADSORBING RESIN AND REMOVING METHOD OF BORON
Document Type and Number:
Japanese Patent JP2000140631
Kind Code:
A
Abstract:

To provide a boron selectively absorbing resin and a removing method of boron capable of surely capturing and removing an extremely trace quantity of boron in water and being utilized for the removal of a ultra trace quantity of boron from ultra pure water used for a semiconductor production process or the removal of a trace quantity of boron from industrial waste water or environmental water.

A boron selectively adsorbing resin is composed of an anion exchange resin carrying a compound having ≥2 phenolic hydroxyl groups and an anionically exchanging site. The boron removing method is by allowing a boron-containing aq. solution to contact with the boron selectively adsorbing resin and by adding the compound having ≥2 phenolic hydroxyl groups and an anionically exchanging site into the boron-containing aq. solution and after that, allowing to contact with the anion exchange resin.


Inventors:
Suzuki, Toshishige
Yokoyama, Toshiro
Kitami, Katsunobu
Nomura, Makoto
Application Number:
JP1998000323826
Publication Date:
May 23, 2000
Filing Date:
November 13, 1998
Export Citation:
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Assignee:
AGENCY OF IND SCIENCE & TECHNOL
KURITA WATER IND LTD
International Classes:
C02F1/28; B01J20/26; B01J41/04; B01J41/12; C02F1/42; C02F1/28; B01J20/22; B01J41/00; C02F1/42; (IPC1-7): B01J20/26; B01J41/04; B01J41/12; C02F1/28; C02F1/42