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Title:
BRITTLE MATERIAL SPLITTING METHOD BY BAND SHAPED HEAT SOURCE
Document Type and Number:
Japanese Patent JPH1034363
Kind Code:
A
Abstract:

To improve working precision and moreover to reduce thermal effect to devices such as a LSI in the case of working a semiconductor wafer or the like.

In this working method, a crack formed in the working start point of a material is guided along a predetermined splitting line with thermal stress by irradiation generating with the application of the heat source of a laser beam or the like. In this case, the material is irradiated with such a band shaped heat source B that the diameter in the direction along the predetermined splitting line L becomes long while the diameter in the rectangular direction becomes short. Whereby, the temperature distribution having a steep grade in the vicinity of the crack end is formed without rising the power density of the heat source.


Inventors:
KAJIWARA KUNIO
OKIYAMA TOSHIHIRO
SHIRAHAMA HIDEYUKI
OONITA EISHIN
SUENAGA TOMOHIRO
KINOSHITA KOICHI
MAEKAWA SHUNICHI
MORITA HIDEKI
Application Number:
JP19623196A
Publication Date:
February 10, 1998
Filing Date:
July 25, 1996
Export Citation:
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Assignee:
SOUEI TSUSHO KK
NAGASAKI PREFECTURE
JAPAN RES DEV CORP
International Classes:
B23K26/40; B23K26/00; B23K26/06; B23K26/073; B23K26/38; H01L21/301; (IPC1-7): B23K26/00; B23K26/00; B23K26/06; H01L21/301
Attorney, Agent or Firm:
Yoshiro Kurauchi