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Title:
BRUSH POLISHING METHOD FOR INNER PERIPHERAL END FACE OF SUBSTRATE FOR RECORDING MEDIUM
Document Type and Number:
Japanese Patent JP2006088321
Kind Code:
A
Abstract:

To provide a polishing method for inner peripheral end faces of substrates for a plurality of disk-type recording mediums with sufficient accuracy.

The brush polishing method is used for polishing the inner peripheral end faces of the substrates 8 for the disk-type recording mediums, and comprised of the following steps. In the first step, the plurality of substrates 8 for the disk-type recording mediums each having a circular hole exhibiting the inner peripheral end face at the center are prepared, and they are superposed on each other by positioning the circular holes to each other, to thereby form a polishing object having a cylindrical hole at the center. In the second step, the polishing object is brought into contact with abrasive slurry 7 containing abrasive. In the following step, while the slurry 7 makes contact with the polishing object, a polishing brush 4 obtained by arranging brushing bristles on a peripheral surface of a rod shaft is inserted into the cylindrical hole of the polishing object, and the polishing brush 4 is rotated about the shaft, to thereby polish the inner peripheral end faces of the respective substrates 8. According to the method, the abrasive slurry 7 is controlled such that its temperature is set to a constant value.


Inventors:
AIDA KATSUAKI
MACHIDA HIROYUKI
Application Number:
JP2005242563A
Publication Date:
April 06, 2006
Filing Date:
August 24, 2005
Export Citation:
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Assignee:
SHOWA DENKO KK
International Classes:
B24B29/00; B24B29/04; B24B37/00
Domestic Patent References:
JPH11221742A1999-08-17
JPH10303155A1998-11-13
JP2002233954A2002-08-20
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Masaya Nishiyama