Bulk adhesion for inclination milling protection

Title:

Bulk adhesion for inclination milling protection

Document Type and Number:

Japanese Patent JP6199979

Kind Code:

B2

Abstract:

To reduce artifacts in a surface exposed by a focused ion beam for viewing, a trench is milled next to the region of interest, and the trench is filled to create a bulkhead. The ion beam is directed through the bulkhead to expose a portion of the region of interest for viewing. The trench is filled, for example, by charged particle beam-induced deposition. The trench is typically milled and filled from the top down, and then the ion beam is angled with respect to the sample surface to expose the region of interest.

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Inventors:

Stacy Stone
Sanhun Lee
Jeffrey Blackwood
Michael schmidt

Application Number:

JP2015535869A

Publication Date:

September 20, 2017

Filing Date:

October 07, 2013

Export Citation:

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Assignee:

F-I-I Company

International Classes:

H01J37/317; B23K15/00; G01N1/28

Domestic Patent References:

JP2006228593A

Foreign References:

US20120112063

Attorney, Agent or Firm:

Masahiko Amagai

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